Date of Award

Fall 2013

Document Type

Thesis

Degree Name

Master of Science (MS)

Department

Electrical & Computer Engineering

Program/Concentration

Electrical and Computer Engineering

Committee Director

Sylvain Marsillac

Committee Member

Shirshak Dhali

Committee Member

Christian Zemlin

Call Number for Print

Special Collections LD4331.E55 H433 2013

Abstract

Atomic Layer Deposition is one of the most efficient deposition processes for obtaining ultrathin films. The deposition by this process happens one atomic layer at a time. ALD is known for its precision and ability to develop quality films with great thickness control. ALD machines simultaneously control DC and AC currents, low pressure operations, temperature control and heating (up to 500'C), precision flow control, precision timing intervals for deposition (milli-second intervals) and constantly monitor temperature. Such a high control comes at a high price. Furthermore, at the university level, the capacity to modify or enhance a machine is critical but rarely obtained with a commercial product.

Hence, we took the challenge to build our own ALD machine. In this thesis, all the steps necessary for fabrication of this new machine, from the new frame, the new hardware for control, operation and safety, to the new software developed under LabView, is presented. In doing so, we have been successful in developing and fabricating a machine which performs all the functionalities of a traditional ALD machine but at a reduced cost and with enhanced safety features. Finally, the functionality and capacity of this machine was demonstrated by doing several successful depositions.

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DOI

10.25777/wrqp-6428

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