This study examined associations between oxidative stress and arsenic (As) exposure and methylation efficiency in semiconductor workers. An As-exposed group (n = 427) and a control group (n = 91) were included. The As-exposure group (n = 427) included 149 maintenance staff members and 278 production staff members representing high As exposure and low As exposure, respectively. The control group included 91 administrative staff members with no or minimal As exposure. An occupational exposure assessment was conducted to assess personal As exposure by measuring As concentrations in urine, hair, and fingernails of the subjects. Urinary As(III), As(V), monomethylarsonic (MMA), and dimethylarsinic acid (DMA) were quantified to assess an internal dose of inorganic As. Urinary 8-hydroxy-2’-deoxyguanosine (8-OHdG) and malondialdehyde (MDA) were measured to asses oxidative DNA damage and lipid peroxidation, respectively. As concentrations in urine, hair, and fingernails significantly increased (p < 0.05) in the As-exposed group in comparison to the control group. Geometric mean urinary concentrations of As, 8-OHdG, and MDA in the As-exposed group significantly exceeded those in the control group. As exposure to As-exposed workers had increased concentrations of 8-OHdG in contrast to those in control subjects. Moreover, urinary 8-OHdG concentrations in the semiconductor workers were positively correlated with urinary total As metabolite (As(III) + As(V) + MMA + DMA) concentrations. Furthermore, urinary excretion of 8-OHdG concentrations in As-exposed workers were positively associated with urinary excretion of MMA concentrations and primary methylation index values (the ration of MMA/inorganic As). However, fingernail and hair samples did not perform as well as urinary samples to measure oxidative stress induced by As exposure. 8-OHdG could serve as a more reliable biomarker for assessing As methylation than MDA did. Occupational exposure to inorganic As was associated with increased oxidative stress among semiconductor workers.
Original Publication Citation
Pan, C.-H., Lin, C.-Y., Lai, C.-H., & Jeng, H. A. (2020). Arsenic exposure and methylation efficiency in relation to oxidative stress in semiconductor workers. Atmosphere, 11(5), 1-15. doi:10.3390/atmos11050464
Pan, Chih-Hong; Lin, Ching-Yu; Lai, Ching-Huang; and Jeng, Hueiwang Anna, "Arsenic Exposure and Methylation Efficiency in Relation to Oxidative Stress in Semiconductor Workers" (2020). Community & Environmental Health Faculty Publications. 93.