Diode Laser Crystallization of Hydrogenated Amorphous Silicon Thin Films for Solar Cell Applications
Date of Award
Summer 2003
Document Type
Thesis
Degree Name
Master of Science (MS)
Department
Mechanical & Aerospace Engineering
Program/Concentration
Mechanical Engineering
Committee Director
Mool C. Gupta
Committee Director
Stephen Cupschalk
Committee Member
Keith Williamson
Call Number for Print
Special Collections; LD4331.E56 E28 2003
Abstract
The research objectives were to prove the crystallization of hydrogenated amorphous silicon (a-Si:H) thin films using a diode laser operating at an 805 nm wavelength and to provide morphology trends in laser crystallized samples. This work was primarily intended for solar cell applications.
One industry goal was to produce a high-efficiency and low-cost solar cell capable of competing economically with other energy sources at large scale in the world market. Excimer laser crystallization was one very promising technique. However, two important problems still hindered economic competition. This research addressed the problems associated with excimer laser crystallization by utilizing a diode laser which provided an increased absorption depth in the silicon layer and dramatically reduced the cost.
Results from x-ray diffraction measurements proved the presence of crystalline silicon after laser treatment. Optical microscope pictures of laser scanned samples were obtained, categorized by surface morphology, and entered into a matrix according to testing conditions. Trends were noticed and morphology predictions were performed.
Rights
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DOI
10.25777/0zfb-j623
Recommended Citation
Eaton, Brian A..
"Diode Laser Crystallization of Hydrogenated Amorphous Silicon Thin Films for Solar Cell Applications"
(2003). Master of Science (MS), Thesis, Mechanical & Aerospace Engineering, Old Dominion University, DOI: 10.25777/0zfb-j623
https://digitalcommons.odu.edu/mae_etds/486