Document Type

Article

Publication Date

2001

Publication Title

Applied Physics Letters

Volume

79

Issue

9

Pages

1240-1242

DOI

10.1063/1.1397760

Abstract

By applying electrical pulses of 20 ns duration to xenon microplasmas, generated by direct current microhollow cathode discharges, we were able to increase the xenon excimer emission by more than an order of magnitude over direct current discharge excimer emission. For pulsed voltages in excess of 500 V, the optical power at 172 nm was found to increase exponentially with voltage. Largest values obtained were 2.75 W of vacuum-ultraviolet optical power emitted from a single microhollow cathode discharge in 400 Torr xenon with a 750 V pulse applied to a discharge. Highest radiative emittance was 15.2 W/cm2. The efficiency for excimer emission was found to increase linearly with pulsed voltages above 500 V reaching values of 20% at 750 V.

Comments

This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in Applied Physics Letters 79 (9) 1240-1242 and may be found at https://doi.org/10.1063/1.1397760.

Original Publication Citation

Moselhy, M., Stark, R. H., Schoenbach, K. H., & Kogelschatz, U. (2001). Xenon excimer emission from pulsed microhollow cathode discharges. Applied Physics Letters, 79(9), 1240-1242. doi:10.1063/1.1397760

ORCID

0000-0001-7867-7773 (Schoenbach)

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