Document Type
Article
Publication Date
2016
DOI
10.1149/2.0151609jss
Publication Title
ECS Journal of Solid State Science and Technology
Volume
5
Issue
9
Pages
P503-P508
Abstract
In this paper, lead chalcogenide based thermoelectric nanolaminate structures were fabricated by alternately depositing PbTe and PbSe ALD layers on regular planar silicon wafers and on microporous silicon templates. Lead bis(2,2,6,6-tetramethyl-3,5-heptanedionato) (Pb(C11H19O2) 2), plus (trimethylsilyl) telluride ((Me3Si)2Te) and (trimethylsilyl) selenide ((Me3Si)2Se) were used as the chemical ALD precursors for lead, tellurium and selenium, respectively. The Seebeck coefficient in horizontal direction (parallel direction to the surface) to the multiple layered PbTe/PbSe nanolaminate structures was measured by an MMR Seebeck system, and benchmarked against the Seebeck coefficient in the vertical direction to the sample surface. The results of the Seebeck measurements clearly indicate that the multiple layered PbTe/PbSe nanolaminate structures synthesized by ALD on microporous silicon templates exhibit significantly increased Seebeck coefficients in both horizontal and vertical directions, in stark contrast to the case when the same ALD thermoelectric nanolaminates are grown on regular planar bulk Si substrates.
Original Publication Citation
Chen, X., Lin, P. T., Zhang, K., Baumgart, H., Geist, B., & Kochergin, V. (2016). Seebeck coefficient enhancement of ALD PbTe/PbSe nanolaminate structures deposited inside porous silicon templates. ECS Journal of Solid State Science and Technology, 5(9), P503-P508. doi:10.1149/2.0151609jss
Repository Citation
Chen, Xin; Lin, Pengtao; Zhang, Kai; Baumgart, Helmut; Geist, Brian; and Kochergin, Vladimir, "Seebeck Coefficient Enhancement of ALD PbTe/PbSe Nanolaminate Structures Deposited Inside Porous Silicon Templates" (2016). Electrical & Computer Engineering Faculty Publications. 145.
https://digitalcommons.odu.edu/ece_fac_pubs/145
ORCID
0000-0002-1191-4532 (Lin)
Comments
This is an open access article distributed under the terms of the Creative Commons Attribution 4.0 License (CC BY, http://creativecommons.org/licenses/by/4.0/) which permits unrestricted reuse of the work in any medium, provided the original work is properly cited.