Document Type
Conference Paper
Publication Date
7-1-2019
DOI
10.18429/JACoW-SRF2019-TUP079
Publication Title
Proceedings of the 19th International Conference on RF Superconductivity
Pages
639- 643
Conference Name
19th International Conference on RF Superconductivity (SRF'19), Dresden Germany, 30 June-05 July 2019
Abstract
Nb3Sn is considered as an alternative of Nb for SRF accelerator cavity application due to its potential to obtain higher quality factors and higher accelerating gradients at a higher operating temperature. Magnetron sputtering is one of the effective techniques that can be used to fabricate Nb3Sn on SRF cavity surface. We report on the surface properties of Nb3Sn films fabricated by sputtering multiple layers of Nb and Sn on sapphire and niobium substrates followed by annealing at 950°C for 3 h. The crystal structure, film microstructure, composition and surface roughness were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), energy dispersive X-ray spectroscopy (EDS), and atomic force microscopy (AFM). The RF performance of the Nb3Sn coated Nb substrates were measured by a surface impedance characterization system. We also report on the design of a multilayer sputter deposition system to coat a single-cell SRF cavity.
Original Publication Citation
Sayeed, M., Burton, M., Elsayed-Ali, H., Eremeev, G., Pudasaini, U., Reece, C., & Valente-Feliciano, A. M. (2019). Deposition of Nb₃Sn films by multilayer sequential sputtering for SRF cavity application. Proceedings of the 19th International Conference on RF Superconductivity (SRF'19), 637-641. JACOW Publishing, Geneva, Switzerland. 10.18429/JACoW-SRF2019-TUP079
Repository Citation
Sayeed, Md. N.; Elsayed-Ali, Hani E.; Pudasaini, U.; Eremeev, G.V.; Reece, C.E.; Burton, M.; and Valente-Feliciano, A.M., "Deposition of Nb₃Sn Films by Multilayer Sequential Sputtering for SRF Cavity Application" (2019). Electrical & Computer Engineering Faculty Publications. 234.
https://digitalcommons.odu.edu/ece_fac_pubs/234
Comments
Open access under the terms of the Creative Commons Attribution license (CC By 3.0 U.S.).