Solution Atomic Layer Deposition of Smooth, Continuous, Crystalline Metal-Organic Framework Thin Films
Chemistry of Materials
For the first time, a procedure has been established for the growth of surface-anchored metal–organic framework (SURMOF) copper(II) benzene-1,4-dicarboxylate (Cu-BDC) thin films of thickness control with single molecule accuracy. For this, we exploit the novel method solution atomic layer deposition (sALD). The sALD growth rate has been determined at 4.5 Å per cycle. The compact and dense SURMOF films grown at room temperature by sALD possess a vastly superior film thickness uniformity than those deposited by conventional solution-based techniques, such as dipping and spraying while featuring clear crystallinity from 100 nm thickness. The highly controlled layer-by-layer growth mechanism of sALD proves crucial to prevent unwanted side reactions such as Ostwald ripening or detrimental island growth, ensuring continuous Cu-BDC film coverage. This successful demonstration of sALD-grown compact continuous Cu-BDC SURMOF films is a paradigm change and provides a key advancement enabling a multitude of applications that require continuous and ultrathin coatings while maintaining tight film thickness specifications, which were previously unattainable with conventional solution-based growth methods.
Copyright © 2022 The Authors.
This is an open access article published under a Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International (CC BY-NC-ND 4.0) license.
The Supporting Information is available free of charge at https://pubs.acs.org/doi/10.1021/acs.chemmater.2c01102.
Detailed description of the experimental methods and used materials; additional QCM measurements; scheme of the growth of Cu-BDC SURMOF by sALD sALD setup; ; and additional characterization data of Cu-BDC (PDF)
Original Publication Citation
Barr, M. K. S., Nadiri, S., Chen, D.-H., Weidler, P. G., Bochmann, S., Baumgart, H., Bachmann, J., & Redel, E. (2022). Solution atomic layer deposition of smooth, continuous, crystalline metal-organic framework thin films. Chemistry of Materials, 34(22), 9836-9843. https://doi.org/10.1021/acs.chemmater.2c01102
Barr, Maïssa K.S.; Nadiri, Soheila; Chen, Dong-Hui; Weidler, Peter G.; Bochmann, Sebastian; Baumgart, Helmut; Bachmann, Julien; and Redel, Engelbert, "Solution Atomic Layer Deposition of Smooth, Continuous, Crystalline Metal-Organic Framework Thin Films" (2022). Electrical & Computer Engineering Faculty Publications. 344.