Document Type
Article
Publication Date
2023
DOI
10.1063/5.0170106
Publication Title
Applied Physics Letters
Volume
123
Issue
22
Pages
222102 (1-6)
Abstract
Spin polarized photocathodes are key to the future operation of electron accelerators such as the ones at Thomas Jefferson National Accelerator Facility and Brookhaven National Laboratory. Currently, these photocathodes come in short supply due to limited production by molecular beam epitaxy. By developing a process to implement similar structures using metal organic chemical vapor deposition, the availability of these devices can be increased. In this paper, we detail the implementation of recent photocathode advancements via metal organic chemical vapor deposition process and show an improvement in both polarization and quantum efficiency of our devices compared to those fabricated via molecular beam epitaxy, with devices reaching 82% polarization and 2.9% quantum efficiency.
Rights
This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in
Belfore, B., Masters, A., Poudel, D., Blume, G., Polly, S., Wang, E., Hubbard, S. M., Stutzman, M., Grames, J. M., Poelker, M., Grau, M., & Marsillac, S. (2023). High figure of merit spin polarized electron sources grown via MOCVD. Applied Physics Letters, 123(22), 1-6, Article 222102.
and may be found at https://doi.org/10.1063/5.0170106
Included with a 12 month embargo in accordance with publisher policy.
Data Availability
Article states: "The data that support the findings of this study are available from the corresponding author upon reasonable request."
Original Publication Citation
Belfore, B., Masters, A., Poudel, D., Blume, G., Polly, S., Wang, E., Hubbard, S. M., Stutzman, M., Grames, J. M., Poelker, M., Grau, M., & Marsillac, S. (2023). High figure of merit spin polarized electron sources grown via MOCVD. Applied Physics Letters, 123(22), 1-6, Article 222102. https://doi.org/10.1063/5.0170106
Repository Citation
Belfore, Benjamin; Masters, Adam; Poudel, Deewakar; Blume, Greg; Polly, Stephen; Wang, Erdong; Hubbard, Seth M.; Stutzman, Marcy; Grames, Joseph M.; Poelker, Matt; Grau, Matt; and Marsillac, Sylvain, "High Figure of Merit Spin Polarized Electron Sources Grown Via MOCVD" (2023). Electrical & Computer Engineering Faculty Publications. 429.
https://digitalcommons.odu.edu/ece_fac_pubs/429
ORCID
0009-0009-4724-8859 (Masters), 0000-0001-8069-8602 (Poudel), 0000-0003-4223-2259 (Blume), 0000-0002-2684-6923 (Grau), 0000-0003-0826-8119 (Marsillac)
Included in
Engineering Physics Commons, Materials Science and Engineering Commons, Organic Chemistry Commons