Document Type

Article

Publication Date

2015

DOI

10.1149/2.0241509jss

Publication Title

ECS Journal of Solid State Science and Technology

Volume

4

Issue

9

Pages

P398- P401

Abstract

This study investigates the nanomechanical properties and surface morphology of tungsten oxide WO3thin films deposited on p-type Si(100) substrates using atomic layer deposition (ALD) technology with 2000 ALD deposition cycles at a growth temperature of 300°C and annealed at different temperatures. The samples were further furnace annealed at 500, 600 and 700°C for 60 min. The influence of the deposition process on the structure and properties of the WO3 films is discussed, presented and correlated to the characteristic features of the ALD technique. The results depict significant difference in the hardness and modulus measurements between the as deposited sample and the annealed ones. The hardness and modulus drop from 14 and 170 GPa for the as deposited sample to 10 and 140 GPa for the annealed ones respectively. Surface roughness was observed to increase with annealing temperature and the initially amorphous as deposited sample reached complete recrystallization and transformed into polycrystalline films as indicated by XRD.

Comments

This is an open access article distributed under the terms of the Creative Commons Attribution 4.0 License (CC BY, http://creativecommons.org/licenses/by/4.0/), which permits unrestricted reuse of the work in any medium, provided the original work is properly cited.

Original Publication Citation

Mamun, M. A., Zhang, K., Baumgart, H., & Elmustafa, A. A. (2015). Nanomechanical and morphological characterization of tungsten trioxide WO3 thin films grown by atomic layer deposition. ECS Journal of Solid State Science and Technology, 4(9), P398-P401. doi:10.1149/2.0241509jss

ORCID

0000-0001-8019-448X (Mamun)

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