Document Type
Article
Publication Date
1992
Publication Title
Journal of Applied Physics
Volume
71
Issue
9
Pages
4354-4357
DOI
10.1063/1.351365
Abstract
The dark current characteristics of gallium arsenide doped with silicon and compensated with diffused copper were found to have a pronounced region of current controlled negative differential conductivity (ndc) similar to the characteristics of a thyristor. The resistivity of the semi‐insulating semiconductor was measured to be 105 Ω cm for applied voltages up to 2.2 kV, which corresponds to an average electric field of 38 kV/cm. At higher voltages, a transition to a stable high current state was observed with a current rate of rise exceeding 1011 A/s. There is evidence of the formation of at least one current filament during this transition. A theoretical model based on drift diffusion and boundary conditions that allows double carrier injection at the contacts has been used to show that the observed negative differential resistance is due to the filling of deep copper acceptors. The model also shows that the ndc curves may be tailored by adjusting the copper concentration. Doping of GaAs with various concentrations of copper was shown to change the dark current characteristics in a way predicted by the model.
Original Publication Citation
Roush, R. A., Schoenbach, K. H., & Brinkmann, R. P. (1992). Bistable behavior of the dark current in copper‐doped semi‐insulating gallium arsenide. Journal of Applied Physics, 71(9), 4354-4357. doi:10.1063/1.351365
Repository Citation
Roush, R. A.; Schoenbach, K. H.; and Brinkmann, R. P., "Bistable Behavior of the Dark Current in Copper-Doped Semi-Insulating Gallium Arsenide" (1992). Bioelectrics Publications. 264.
https://digitalcommons.odu.edu/bioelectrics_pubs/264
ORCID
0000-0001-7867-7773 (Schoenbach)
Comments
This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in Journal of Applied Physics, 71 (9) 4354-4357 and may be found at https://doi.org/10.1063/1.351365.