Document Type

Conference Paper

Publication Date

2025

DOI

10.22323/1.472.0071

Publication Title

Proceedings of 20th International Workshop on Polarized Source, Targets, and Polarimetry - PoS(PSTP2024)

Volume

472

Pages

071 (1-7)

Conference Name

20th International Workshop on Polarized Source, Targets, and Polarimetry, PSTP 2024, September 22-27, 2024, Newport News, Virginia

Abstract

In this work, we investigate heat cleaning options for high-polarization GaAs/GaAsP strained-superlattice (SSL) photocathodes with a distributed Bragg reflector (DBR) that were grown using metalorganic chemical vapor deposition (MOCVD). This was done using a microMott polarimeter at Jefferson Lab to optimize both quantum efficiency and polarization. The fabrication process for MOCVD-grown photocathodes does not allow for the inclusion of an arsenic cap, contrary to what is done when fabricating photocathodes using molecular-beam epitaxy (MBE). Without proper preparation, the performance of MOCVD-grown photocathodes can be limited due to surface contamination. Here, we varied both duration and temperature of the heat cleaning process and observed increased quantum efficiency with negligible loss of polarization. Results of the optimized cleaning process in addition to upgrades to the testing apparatus are presented.

Rights

© 2025 The Authors.

Copyright owned by the authors under the term of the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International (CC BY-NC-ND 4.0) License.

Original Publication Citation

Blume, G., Masters, A., Grames, J., Stutzman, M., Grau, M., & Marsillac, S. (2025). Preparation of MOCVD-grown photocathodes containing a strained GaAs/GaAsP superlattice. Proceedings of 20th International Workshop on Polarized Source, Targets, and Polarimetry - PoS(PSTP2024), 472, Article 071. https://doi.org/10.22323/1.472.0071

ORCID

0000-0003-4223-2259 (Blume), 0009-0009-4724-8859 (Masters), 0000-0002-2684-6923 (Grau), 0000-0003-0826-8119 (Marsillac)

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